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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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Tabletop Mask Aligner
Model 200
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Large Substrate Mask Aligner
Model 6020
The Model 6020 is a large substrate Production Mask Aligner or Auto-flood Exposure System for RDL First Level Advanced Packaging (PLP) and markets requiring exposure of large glass panels. It is engineered with OAI’s precision, reliability, and quality that is found in all of OAI’s products. The features include wedge effect leveling, superb process repeatability, ≤ 2.0µm printing resolution, and remote diagnostics. Using robotic handling, the system can stand alone or be fully integrated with photo resist processing.
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Tabletop Front & Backside Mask Aligner
Model 200IR
The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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MRM(Mask)
MRM Series
- Fully automated system that can produce masks by automating the mask production process such as fabric supply, molding, cutting, and bonding.
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Mask Testing Instrument(N95,KN95,Disposable Mask)
Sanwood Environmental Chambers Co ., Ltd.
Is used to test the filtration level of aerosol particles by respirator filter element under certain environmental conditions.
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Photo Detectors
Our photo detectors are offered for both power or energy measurements. Measure as low as a few femtojoules in energy or a few picowatts in power, thanks to our highly sensitive sensors and performant electronics.
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Mask Treatment Process
Model 100MT
OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and thus enables your mask aligner to have increased productivity at the lowest cost of ownership. The Model 100 MT is a 2 step process.
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Photo Detector Testing
With the rise of 5G technology and popularization mobile devices, more and more advanced photoelectric sensors are used in our daily lives. In order to be better applied to mobile devices, the photosensitive area of these advanced photodetector is getting smaller and smaller. However, these applications place higher and higher requirements on the light sensing performance of advanced photodetectors. In the process of shrinking the photosensitive area, it also brings the challenge of accurate measurement of quantum efficiency. Enlitech adopts the spatial light homogenizing technology and follows the ASTM standard “Irradiance Mode” test method, which is proven that it can accurately perform quantum efficiency and other key parameter measurements of advanced photodetectors.
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MASK MVM-SEM® E3600 Series
E3630
Together with the miniaturization of semiconductors, high-accurate and stable measurement and evaluation is needed for circuit patterns such as mask patterns and holes. Advantest's E3600 series are used by a wide variety of companies, from semiconductor manufacturers to photomask makers to device and materials producers.
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Medical Mask Gas Exchange Pressure Difference Tester
DRK371
Shandong Drick Instruments Co., Ltd.
It is used to measure the gas exchange pressure difference of medical surgical masks and other products.
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Mask Bacterial Filtration Efficiency (BFE) Tester
WKS-1010
WKS-1010 Mask Bacterial Filtration Efficiency (BFE) Tester is used to test the percentage of the mask material to filter out the suspended particles containing bacteria under the specified flow rate. It is suitable for the performance test of the bacterial filtration efficiency of medical surgical masks by metrological inspection departments, scientific research institutes, medical mask manufacturers and other related departments.
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Front & Backside, Semi-Automatic Mask Aligner
Model 800E
The OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this mask aligner, OAI meets the growing challenge of the dynamic semiconductor and MEMS market with a new class of mask aligners that are engineered for R&D and low volume production.
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Medical Masks Synthetic Blood Penetration Tester
WKS-8010
WKS-8010 Medical Masks Synthetic Blood Penetration Tester is to test the mask material with synthetic blood under continuous pressure, and visually inspect the penetration of synthetic blood on the material. It is suitable for the resistance of masks to the penetration of synthetic blood under different levels of test pressure.
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Large Photo Signal Generator
DDS9m
170MHz 4-Channel Signal Generator. The DDS9m generates four independent, phase synchronous sine wave output signals and is programmable in 0.1Hz steps from 0.1Hz to 171MHz. Programming is via an RS232 serial interface. Phase is 14-bit programmable and amplitude is 10-bit programmable. The DDS9m is accurate to 1.5ppm when using the on board TCXO timebase or you can use an external timebase. It requires 3.3 VDC power. SOF8_409 windows software is available as an extra cost accessory.
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Photo Gate Logger Sensor
NUL-209
This sensor can be used to study various kinds of motion. With six modes of operation, time, velocity or acceleration can be measured with one or two photo gates and associated timing cards, as well as showing pictorially the status (digital 1 or 0) of the voltage output of the photo gate as timing cards pass through it.
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Photo Optic Sensors
From patient monitoring in hospitals, to wearables and home healthcare applications, TE Connectivity (TE) offers photo optic sensors and components for non-invasively measuring blood oxygenation (SpO₂) level. With more than 27 years of proven reliability and expertise, TE has designed SpO2 sensors with best-in-class flexibility to accommodate multiple wavelength options. Our ability to provide both components and complete sensor packages make us the leading choice for pulse oximetry applications that require high degrees of precision, durability and performance.
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DisplayMate Multimedia with Test Photos Edition
DisplayMate Technologies Corporation
DisplayMate Multimedia with Test Photos Edition is an enhanced version of the standard Multimedia Edition that adds a carefully chosen set of very high quality high resolution photographs for calibrating, testing, evaluating, and tweaking monitors, projectors and HDTVs, automatically scaled to the native resolution of the display. It has everything in the standard Multimedia Edition including all of its 500+ test patterns up through 4100 x 4100 resolution.
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Mask UV Sterilizers
UV-MASK
Mask UV Sterilizer applies to sterilizing the surface of masks, protective clothing, food, toys and other objects. It is widely used in hospitals, food, tea food and beverage processing and packaging equipment, food factories, cosmetics factories, dairy factories, breweries, beverage factories, bakeries and refrigerators, etc.
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Mask Produce and Test Machine
LISUN produce the bfe tester for face mask, pfe tester, melt-blown cloth electrostatic electret generator according to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1
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Bounded Output Mask
The bounded output mask provides a means of ensuring that measurements of TI according to IEC 62359 can satisfy the requirement of only determining the ultrasonic output through an area of 1 cm x 1 cm.
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Custom Solutions for Mask Aligners
OAI offers custom designed solutions built to your unique specification.
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Masks Flame Retardant Performance Tester
WKS-1208
WKS-1208 Masks Flame Retardant Performance Tester is used to test the burning performance of the mask after contacting the flame at a certain linear velocity. It is special test instrument for the flame retardant performance of masks.
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Masks Particle Filtration Efficiency Tester
Sataton Instruments Technology CO., Ltd
Face masks particle filtration efficiency (BFE) tester is device to determine the particle filter penetration and filtration efficiency for respiratory protective devices and face masks. The tester with particle generator can provide sodium chloride particles and paraffin oil particles. It can measure the particle penetration, filtering efficiency and the breathing resistance delta P. It is widely used in quality control, research and development, certification, manufacturing or testing industry, etc.
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NanoLattice Pitch Standard for Mask Handling Tools (NLSM)
The NanoLattice™ (NLSM) 100 nm pitch standard utilizes gratings with near perfect periodicity to calibrate magnification and scan linearity of CD-SEM and Atomic Force Microscopes (AFM). Make the grade, with the only pitch standard of its kind available below the 130 nm node.
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MASK DR-SEM
Our defect review SEM tools perform detailed reviews of minute defects on photomasks.
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Face Masks Particulate Filtration Efficiency PFE Tester
GLE-20
GLE-20 is an oil-salt two-in-one Face Masks Particulate Filtration Efficiency PFE Tester. According to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1, etc. It is used to test the particulate filtering efficiency of daily protective masks and medical masks, and to determine the obstruction performance of ordinary fabrics and medical protective masks against a constant flow of airflow.
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MASK MVM-SEM® E3600 Series
E3650
Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
