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- Taylor Dynamometer, Inc.
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Towing Dynos for Full-Sized Cars & Light Trucks
Designed to maintain 2,248 to 5,620 lb (10,000 to 25,000 N) of constant drawbar pull, our towing dynamometers for full-sized cars to light trucks are powered by an industrial generator to provide unlimited testing at low speeds. Each model features aluminum frame, independent suspension, aero dynamic body and wireless touchscreen controller.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Ultraviolet Checker
For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Ultraviolet Microscope
UVM-1
The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Light Microscopes
Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Serial FPDP Extreme 1/2 ATR Recorder
Talon RTX 2596
- Rugged 1/2 ATR MIL-spec chassis for harsh mechanical and thermal environments- Environmentally sealed, conduction-cooled- Fully sealed for RF emissions with EMI power line filter- MIL-STD circular connectors- Compact and lightweight design - 18 lb (8 kg)- QuickPac® drive packs allow quick removal of all data storage up to 61 TB via the front panel- Ideal for UAVs, military vehicles, aircraft pods and outdoor environments- Four-channel Serial FPDP record/playback- Supports Flow Control, CRC, and Copy/Loop Mode as a receiver and transmitter- Supports 1.0625, 2.125, 2.5, 3.125 and 4.25 GBaud link rates- Single-mode and multi-mode fiber interfaces available- Sustained real-time record rates up to 4 GB/s- 12 to 28 VDC power supply- Optional GPS receiver for precise time and position stamping- SystemFlow API, GUI and Signal Viewer analysis tools- Optional telnet remote connection to recorder
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Timing Lights
A stroboscope used to dynamically set the ignition timing of an Otto cycle or similar internal combustion engine equipped with a distributor. Modern electronically controlled passenger vehicle engines require use of a scan tool to display ignition timing.
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Light Meter
PLMT68
Light Meter Measures In Lux and Foot Candles (User Selectable)Over-Range IndicatorAuto RangingPeak Hold, Max and Data HoldRelative ModeLong-Life Silicon Photo Diode InsideMeasurement Rate: 1.5 Times per SecondMax Range: 400,000 LuxAccuracy: +/- 5% Under 10000 Lux, +/- 10% Over 10000 LuxMax Resolution: 0.1 Lux/FCAccessories Included: 9V Battery, Carrying Case, Photo DetectorDimensions: 6.50' H x 2.99' W x 1.69' DWeight: 14.22 oz.Sold as : Unit
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Light Meter
Ideal for measuring mercury, xenon, metal halide or fluorescent lamps, commonly used for studies in the UVA region, as well as sunlight.
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Deep Ultraviolet Observation System for Microscope
U-UVF248
Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Light Source
UVF-210S
By traversing two light guide ends (right and left) by means of the high accuracy air cylinder, alternating irradiation of two independent positions is possible.
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Light Sources
These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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DC-AC Sine Wave Inverters for Ultraviolet (UV) Lamps
UV Lamp Inverters
The sine wave inverters are designed and built to meet any customer input/output and mechanical configuration requirements.
