MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive,
Suite 201
Andover, MA 01810
United States
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High Performance Heated Absolute Pressure Transducers
These high performance Baratron® capacitance manometers have the sensor located in a temperature controlled constant temperature oven for improved accuracy. They are available with an analog output or digital communications for measuring absolute pressure.
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DELTA™ II 2-zone Flow Ratio Controller
The DELTA™ II Flow Ratio Controller divides and controls mixed process gas flows to either multiple chambers or zones within a process chamber at ratios specified by the user maximizing process uniformity and repeatability. It is available with EtherCAT® or DeviceNet™ communications.
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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SmartPower® Microwave Power Generators
AX2500
SmartPower® AX2500 Series intelligent microwave power generators build on ASTeX's experience in producing rugged, reliable microwave power generators for demanding semiconductor fabrication and industrial applications. The AX2500 design architecture incorporates the best of ASTeX field-proven technology, and combines new design features aimed at improved performance and lower cost of ownership.
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Microwave Plasma Subsystems
AX2600 And AX2700
The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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General Performance Absolute Pressure Switches
These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.
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High Temperature Absolute Pressure Transducers
Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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KEINOS™ 2 MHz 5 KW, 11 KW & 13 KW RF Plasma Generators
The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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Flow Ratio Controllers
Optimizing process performance just became easier with the DELTA™ Flow Ratio Controller (FRC). Widely used in a variety of flow splitting applications such as etching, stripping, and PECVD, the DELTA™ Flow Ratio Controller (FRC) provides users with the ability to distribute gas or gas mixtures to different zones in a process chamber.
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High Performance Baratron® Absolute Pressure Transducers
These high performance Baratron® capacitance manometers operate at ambient temperature. They are referenced to vacuum for gas independent, direct measurement of absolute pressure.
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Compact PCI Cards And Cages
We offer a wide variety of CompactPCI (cPCI) digital I/O cards, and card cages with robust and reliable design intended for use in factory automation and process control applications. The CompactPCI form factor allows for easy integration of the cards into cPCI style racks.
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Vacuum Process And Chamber Environment Monitors
Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
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Programmable Industrial PC
HyperPAC
The HyperPAC Industrial PC programmable control solution delivers top of the line performance with reliable operation for a variety of control and automation tasks. Compared to standard IPCs, the HyperPAC provides a highly compact, fanless solution, with existing expandable IO via PCIe, along with flexibility to expand and configure the system. The HyperPAC is a flexible, scalable solution for numerous applications and project requirements which enables IIoT (Industrial Internet of Things) integration.
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Vacuum Quality Monitor Systems
The 835 VQM is a mass spectrometer that operates from UHV to 10-5 Torr and accurately measures the gases in the vacuum chamber. The 835 VQM Differential Pump System delivers the advantages of the 835 VQM at higher pressures. The VQM system consists of an autoresonant ion trap mass spectrometer gauge, a VQM Controller and VQM Viewer software that that converts raw data into actionable information. The system is ratiometric, meaning that it determines the ratio of each gas to other gases in a vacuum chamber. It is usually coupled with a total pressure gauge to provide partial pressures of each gas as indication of the quality of the vacuum in the chamber.
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Process And Chamber Monitoring Software & Systems
MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.